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High Reflective Chrome(HRC) |
Mid-Reflective Chrome(MRC) |
Low Reflective Chrome(LRC) |
Optical Density @ 436 nm |
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Deviation within active area |
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Reflectivity @ 436 nm |
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Film Thickness |
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Film Adhesion |
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Acid Resistance (conc. H2SO4; 120º C) |
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Acid Resistance (conc. H2SO4(4) -
H2O2(1); 70-95º C) |
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Pinholes @ 1-4 ¥ì after U.S. IPA for 2 min. |
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Wet Etching, Etch time (dip) |
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Etch time (APT) |
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Undercut rate(APT, both sides) |
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